Detailed Product Description
Vacuum Coating Machine-------TSU-800 Vacuum Coating Machine is set magnetron sputtering, multi-arc plasma deposition, vapor deposition technology integrates three. Can be used to prepare single-layer or multi-layer metal film, magnetic film, the semiconductor film, film, insulation film, magnetic recording film. optical recording film, a transparent conductive film, high temperature superconductor coating. Also in variants, the particle surface coating on silicon steel. Suitable for teaching and scientific research institutes, research, small and medium enterprises plating processing and production of various films
Appellation | TSU series multifunction coating machine | ||
type | A type | B type | C type |
chamber size | Φ800mm×H800mm | Φ1000mm×H1000mm | Φ1200mm×H1200mm |
Power supply | 3000W bipolar pulse generator*2 4000W Power Multi-Arc target*2 1000W evaporation Power *1 Electromagnetic Power Target *1 | 4000W bipolar pulse generator*2 4000W Power Multi-Arc target*4 2000W evaporation Power *1 Electromagnetic Power Target *1 | 5000W bipolar pulse generator*2 4000W Multi-Arc target*8 3000W evaporation Power *1 Electromagnetic Power Target *1 |
Sputtering target structure | water cooling evaporation electrodes*2 +Φ50.8mm Permanent magnetic target *1+Φ60mmElectromagnetic target*1+ Rectangular targets*2 +Φ65mmMulti-Arc target*2 | water cooling evaporation electrodes*2+Φ50.8mm Permanent magnetic target *1+Φ60mm Electromagnetic target*1+ Rectangular targets*2+Φ65mm Multi-Arc target*4 | water cooling evaporation electrodes*2+Φ50.8mm Permanent magnetic target *1+Φ60mm Electromagnetic target*1+ Rectangular targets*2+Φ65mm Multi-Arc target*8 |
Vacuum chamber | Vertical Pre-open structures,ventilation systems backWorkpiece operation modePublic rotation/ rotation, 0~20rpm, adjustable controlled CVTVacuum measurementDigital Vacuum Gauge composite measurement range from atmospheric to 10-5Pa | ||
Coating method | Magnetron sputtering evaporation +multi-arc plasma deposition +Evaporation | ||
Negative Bias Voltage | 0-1000V 12KW20KW | ||
Coating mode | Metal films, reaction film, magnetic film, multilayer film, dielectric film, organic film, powder coating, etc. | ||
Workpiece standard | Available water cooling, heating, revolution and rotation able to sample thickness monitor. | ||
Base pressure | 8×10-5Pa or 8×10-4Pa | ||
Vacuum system components | molecular pump+ Roots pump + mechanical pump or diffusion pump + Roots pump + mechanical pump | ||
Pumping speed | less than or equal to 20min from the air to 10-3Pa | ||
membrane uniformity | ≤±5% | ||
Target and Target Power | Target utilization 30%~60% | ||
Workpiece baking temperature | Adjustable controlled room temperature to 200 ° C (PID Temperature Control) | ||
Vacuum control | A type is Manual , BC type is Automatic Control | ||
gas control | Three sets of gas control system, gas flow control 5L/3L/2L accuracy ± 0.1sccm. | ||
protection | Equipment is being driven, under compaction, flow, over-voltage protection devices | ||
| power≥20KW,area9m2 | ||
Option devices | Quartz oscillator thickness devices Hall ion source, and the circulating water machines pump, PLC, PC control, the anti-laundering sputtering | ||
